Information and communications technology (ICT) has been developing at a dizzying pace during the digital and networking age of the 21st century, and manufacturing technology has been making rapid progress in areas such as semiconductors and flat-panel displays. Shinryo’s precision cleaning technology removes micron- to nano-scale contaminants that are invisible to the naked eye (such as particles and metals) in a fine-grained manner. Going forward, we remain committed to utilizing advanced precision cleaning and surface modification technologies to help customers increase yields and lower costs.
Results of an analysis of an eluted metal after Si electrode washing
Na | K | Ca | Mg | Al | Fe | Cr | Ni | Cu | Mn | Zn | Ti | Si | |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
After washing by Shinryo | <1 | <1 | <1 | <1 | <1 | <1 | <1 | <1 | <1 | <1 | <1 | <10 | <10 |
After washing by a competitor (Japan) | 3 | 1 | 1 | 1 | 23 | <1 | <1 | 26 | <1 | <1 | 1 | <10 | <10 |
After washing by the manufacturer (overseas) | 6 | 3 | 5 | <1 | <1 | 2 | <1 | <1 | <1 | <1 | 2 | <10 | <10 |
(Unit: Parts per billion)